The Plasma-X-Ray-Source is a device used to generate characteristic X-ray pulses with a duration of down to approx. 100 femtoseconds.
X-ray capillary optics are used to guide and shape X-radiation.
Tailored process instrumentation is used to an increasing degree to ensure a consistent quality of industrial products by monitoring their technological production processes.
HELMUT FISCHER GMBHINSTITUT FÜR ELEKTRONIK UND MESSTECHNIK
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